Epoch Platform OCXO
The Epoch Platform MEMS OCXO (Oven Controlled Oscillator) series represents the next generation in OCXO technology, addressing the enduring challenges associated with quartz OCXOs. Quartz OCXOs have historically suffered from issues related to reliability and susceptibility to performance deterioration when exposed to environmental stressors. In stark contrast, Epoch Platform OCXOs exhibit remarkable resilience to thermal shock, airflow, and vibration. Moreover, they offer an enhanced design experience with their industry-leading compact size, reduced power consumption, and robustness, rendering the use of protective covers, often essential for quartz OCXOs, unnecessary.Key Benefits:
- 2x Better Service Continuity
- 25x Less PCB Volume
- 3x Lower Power
Epoch Series SiT58xx Overview:
* All devices offer: (1) digital frequency pulling (DCOCXO) via I2C/SPI with up to ±400 ppm pull range and resolution down to 0.05 ppt; (2) supply voltage options of 2.5V, 2.8V, and 3.3V; and (3) regulated LVCMOS or clipped sinewave output. * For aerospace and defense applications, please contact us
| Device* | Stability | Holdover | Frequency | Temp. Range | Size (mm) | Features |
|---|---|---|---|---|---|---|
| SiT5811 | ±1 ppb | 8 hours | 10 to 60 MHz |
Up to
-40 to +95°C
|
9.0 x 7.0 x 3.6 | 420 mW power consumption, ±10 ppt/°C frequency slope |
| SiT5812 | ±1 ppb | 8 hours | 60 to 220 MHz |
Up to
-40 to +95°C |
9.0 x 7.0 x 3.6 | 460 mW power consumption, ±10 ppt/°C frequency slope |
| SiT5801 | ±3, 5 ppb | 6 hours | 10 to 60 MHz |
Up to
-40 to +95°C |
9.0 x 7.0 x 3.6 | 420 mW power consumption, ±20 ppt/°C frequency slope |
| SiT5802 | ±3, 5 ppb | 6 hours | 60 to 220 MHz |
Up to
-40 to +95°C |
9.0 x 7.0 x 3.6 | 460 mW power consumption, ±20 ppt/°C frequency slope |
* All devices offer: (1) digital frequency pulling (DCOCXO) via I2C/SPI with up to ±400 ppm pull range and resolution down to 0.05 ppt; (2) supply voltage options of 2.5V, 2.8V, and 3.3V; and (3) regulated LVCMOS or clipped sinewave output. * For aerospace and defense applications, please contact us
